Compact and low loss silicon-on-insulator ridge waveguide 90° bend

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Permanent URL	http://hdl.lib.byu.edu/1877/577
Title	Compact and low loss silicon-on-insulator ridge waveguide 90° bend
BYU Creator	Qian, Y. Nordin, Gregory P.
Creator	Kim, S. Song, J. Jiang, J.
Keywords	integrated optics; guided waves; integrated optics devices; planar waveguides; photonic integrated circuits; total internal reflection
Description/Abstract	A compact and low loss silicon-on-insulator rib waveguide 90° bend is designed and demonstrated. An interface realized by a trench filled with SU8 at the corner of a waveguide bend effectively reflects incoming light through total internal reflection (TIR). In order to accurately position the SU8-filled trench relative to the waveguide and reduce sidewall roughness of the interface, electron beam lithography (EBL) is employed while inductively coupled plasma reactive ion etching (ICP RIE) is used to achieve a vertical sidewall. The measured loss for TE polarization is 0.32 dB ± 0.02 dB/bend at a wavelength of 1.55 µm.
Source	Yusheng Qian, Seunghyun Kim, Jiquo Song, Gregory P. Nordin, and Jianhua Jiang, "Compact and low loss silicon-on-insulator ridge waveguide 90° bend" Opt. Express 14, pp. 6020-6028 (2006). http://www.opticsexpress.org/abstract.cfm?URI=oe-14-13-6020;
Publisher	Optical Society of America
Date Original	2006
Date Digital	2007-11-15
Language	English eng en
Publication Type	Peer-Reviewed Articles
Type	Text
Format	application/pdf
Owning Institution	Brigham Young University
BYU College	Ira A. Fulton College of Engineering and Technology
BYU Department	Electrical and Computer Engineering
Copyright Status	(c) 2006 Optical Society of America;
Copyright Use Information	http://www.lib.byu.edu/generic_copyright.html

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Compact and low loss silicon-on-insulator ridge waveguide 90° bend

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